An alloy sputtering target is a piece of metal that is made up of a mixture of two or more elements. It is used in a process called sputter deposition, which is a type of physical vapor deposition (PVD). In this process, a high-energy beam of ions is used to sputter, or knock atoms off, the surface of the target material. The sputtered atoms are then deposited onto a substrate to form a thin film.
Alloy sputtering targets are used in a variety of applications, including the production of electronic devices, decorative coatings, and optical films. They are also used in the production of solar cells and other renewable energy technologies.
Alloy sputtering targets are often used when it is desired to produce a thin film with specific properties that cannot be achieved with a pure metal target. For example, an alloy may be used to produce a film with improved corrosion resistance or improved electrical conductivity. Some common alloy sputtering targets include stainless steel, brass, and bronze.
The specific alloy used as a sputtering target will depend on the desired properties of the thin film being produced and the specific application for which it will be used. In order to produce a high-quality thin film, it is important to use a well-prepared and homogeneous alloy sputtering target.
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