AlRepresentative visual
Aluminum (Al) Sputtering Target
High-purity Aluminum (Al) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
PVD & THIN-FILM MATERIALS
Sputtering Targets
Explore 72 common metal, alloy and compound targets. Configure purity, diameter, thickness and backing-plate requirements, or request a non-listed composition and custom geometry.
01I know the material
Search directly by element name, formula or product code.
02I know the dimensions
Choose diameter, thickness, purity and backing plate on the product page.
03I need a custom composition
If it is not listed, submit the exact composition in a custom RFQ note.
ADESIS MATERIALS CATALOGUE
Search all standard target families in this catalogue and add them to one multi-item RFQ. Submit non-listed compositions and custom geometries in the technical notes.
01Pure Metal Targets31 products02Alloy Targets14 products03Oxide, Nitride & Ceramic Targets27 products
72 products
01
Pure Metal Targets
Transition metals, semiconductor elements and precious metals.
TiRepresentative visual
Titanium (Ti) Sputtering Target
High-purity Titanium (Ti) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuRepresentative visual
Copper (Cu) Sputtering Target
High-purity Copper (Cu) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CrRepresentative visual
Chromium (Cr) Sputtering Target
High-purity Chromium (Cr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NiRepresentative visual
Nickel (Ni) Sputtering Target
High-purity Nickel (Ni) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoRepresentative visual
Cobalt (Co) Sputtering Target
High-purity Cobalt (Co) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
FeRepresentative visual
Iron (Fe) Sputtering Target
High-purity Iron (Fe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MoRepresentative visual
Molybdenum (Mo) Sputtering Target
High-purity Molybdenum (Mo) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
WRepresentative visual
Tungsten (W) Sputtering Target
High-purity Tungsten (W) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TaRepresentative visual
Tantalum (Ta) Sputtering Target
High-purity Tantalum (Ta) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NbRepresentative visual
Niobium (Nb) Sputtering Target
High-purity Niobium (Nb) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZrRepresentative visual
Zirconium (Zr) Sputtering Target
High-purity Zirconium (Zr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
02
Alloy Targets
Binary and multi-element compositions with ratio and tolerance review.
NiCrRepresentative visual
Nickel Chromium (NiCr) Alloy Target
High-purity Nickel chromium (NiCr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiAlRepresentative visual
Titanium Aluminum (TiAl) Alloy Target
High-purity Titanium aluminum (TiAl) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlCuRepresentative visual
Aluminum Copper (AlCu) Alloy Target
High-purity Aluminum copper (AlCu) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
FeCoRepresentative visual
Iron Cobalt (FeCo) Alloy Target
High-purity Iron cobalt (FeCo) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuGaRepresentative visual
Copper Gallium (CuGa) Alloy Target
High-purity Copper gallium (CuGa) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
InSnRepresentative visual
Indium Tin (InSn) Alloy Target
High-purity Indium tin (InSn) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NiFeRepresentative visual
Nickel Iron (NiFe) Alloy Target
High-purity Nickel iron (NiFe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoCrRepresentative visual
Cobalt Chromium (CoCr) Alloy Target
High-purity Cobalt chromium (CoCr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoFeBRepresentative visual
Cobalt Iron Boron (CoFeB) Alloy Target
High-purity Cobalt iron boron (CoFeB) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiWRepresentative visual
Titanium Tungsten (TiW) Alloy Target
High-purity Titanium tungsten (TiW) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlSiRepresentative visual
Aluminum Silicon (AlSi) Alloy Target
High-purity Aluminum silicon (AlSi) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuInGaRepresentative visual
Copper Indium Gallium (CuInGa) Alloy Target
High-purity Copper indium gallium (CuInGa) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
03
Oxide, Nitride & Ceramic Targets
Oxides, nitrides, carbides and composites for RF and reactive sputtering.
ITORepresentative visual
ITO Ceramic Sputtering Target
High-purity Indium tin oxide (ITO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AZORepresentative visual
Aluminum-Doped Zinc Oxide (AZO) Target
High-purity Aluminum-doped zinc oxide (AZO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZnORepresentative visual
Zinc Oxide (ZnO) Sputtering Target
High-purity Zinc oxide (ZnO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SiO₂Representative visual
Silicon Dioxide (SiO₂) Sputtering Target
High-purity Silicon dioxide (SiO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Al₂O₃Representative visual
Aluminum Oxide (Al₂O₃) Target
High-purity Aluminum oxide (Al₂O₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiO₂Representative visual
Titanium Dioxide (TiO₂) Target
High-purity Titanium dioxide (TiO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
HfO₂Representative visual
Hafnium Oxide (HfO₂) Target
High-purity Hafnium oxide (HfO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Ta₂O₅Representative visual
Tantalum Oxide (Ta₂O₅) Target
High-purity Tantalum oxide (Ta₂O₅) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Nb₂O₅Representative visual
Niobium Oxide (Nb₂O₅) Target
High-purity Niobium oxide (Nb₂O₅) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Si₃N₄Representative visual
Silicon Nitride (Si₃N₄) Target
High-purity Silicon nitride (Si₃N₄) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlNRepresentative visual
Aluminum Nitride (AlN) Target
High-purity Aluminum nitride (AlN) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiNRepresentative visual
Titanium Nitride (TiN) Target
High-purity Titanium nitride (TiN) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material