SiRepresentative visual
Silicon Wafer / Si Wafer
Prime, test and research-grade silicon substrates.
- Diameter
- 2"–12"
- Finish
- SSP or DSP
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202 products
Si/SiO₂Representative visual
Thermal Oxide Silicon Wafer
Dry or wet thermal oxide on silicon.
- Diameter
- 2"–8"
- Finish
- SSP or DSP
SiO₂Representative visual
SiO₂ Substrate / Wafer
Fused silica and quartz substrates for advanced research.
- Diameter
- 1"–8"
- Finish
- Single or double-side polished
GaAsRepresentative visual
Gallium Arsenide (GaAs) Wafer
Semi-insulating and doped GaAs substrates.
- Diameter
- 2", 3", 4", 6"
- Finish
- SSP or DSP
InAsRepresentative visual
Indium Arsenide (InAs) Wafer
InAs substrates for infrared, high-mobility and epitaxial research.
- Diameter
- 2"–4" typical
- Finish
- Epi-ready SSP or DSP
GaSbRepresentative visual
Gallium Antimonide (GaSb) Wafer
GaSb substrates for mid-infrared and III–V devices.
- Diameter
- 2"–4" standard
- Finish
- SSP or DSP
GaNRepresentative visual
Gallium Nitride (GaN) Wafer
GaN substrates and GaN-on-carrier structures.
- Diameter
- 2"–6"
- Finish
- Epi-ready
SiCRepresentative visual
Silicon Carbide (SiC) Wafer
4H and 6H SiC substrates for power and research.
- Diameter
- 2"–8"
- Finish
- Si-face or C-face, epi-ready
Al₂O₃Representative visual
Sapphire Wafer
C-, A-, R- and M-plane sapphire substrates.
- Diameter
- 1"–8"
- Finish
- SSP or DSP
ITORepresentative visual
ITO Coated Glass Substrate
Transparent conductive ITO glass with selectable resistance.
- Sheet resistance
- 5–100 Ω/sq typical
- Thickness
- 0.4–3 mm
FTORepresentative visual
FTO Coated Glass Substrate
Thermally stable fluorine-doped tin oxide glass.
- Sheet resistance
- 7–15 Ω/sq typical
- Thickness
- 1.1–3.2 mm
KF / QFRepresentative visual
KF (QF) Flanges & Components
Modular vacuum hardware for fast, reliable assembly.
- Nominal sizes
- KF10–KF50
- Material
- 304L or 316L stainless steel
CFRepresentative visual
CF Flanges & Components
Bakeable all-metal sealing for UHV systems.
- Sizes
- 1.33"–16.5"
- Material
- 304L or 316L stainless steel
ISORepresentative visual
ISO Flanges & Components
Large-bore vacuum connections for high conductance.
- Sizes
- ISO63–ISO630
- Styles
- ISO-K or ISO-F
VIEWRepresentative visual
Vacuum Viewports
Optical access for vacuum and UHV environments.
- Flange
- KF, ISO or CF
- Window
- Fused silica, sapphire, glass
EWBRepresentative visual
Edge-Welded Bellows
Flexible motion, sealing and vibration isolation in vacuum.
- Material
- AM350, 316L, Inconel options
- Motion
- Compression, extension, lateral
Custom Vacuum Chambers
Application-specific chambers from concept to tested assembly.
- Material
- 304L, 316L or aluminium
- Geometry
- Cylindrical, box or custom
AlRepresentative visual
High-Purity Aluminum (Al)
High-purity aluminum source material for epitaxy and evaporation.
- Form
- Pieces, shots or ingot
- Purity
- 5N–7N options
BRepresentative visual
High-Purity Boron (B)
High-purity boron for controlled research and source applications.
- Form
- Pieces, granules or custom
- Purity
- High-purity grades
BiRepresentative visual
High-Purity Bismuth (Bi)
High-purity bismuth pieces and source material.
- Form
- Pieces, shots or ingot
- Purity
- 5N–7N options
GeRepresentative visual
High-Purity Germanium (Ge)
High-purity germanium for semiconductor and deposition research.
- Form
- Pieces, shots or ingot
- Purity
- 5N–7N options
SbRepresentative visual
High-Purity Antimony (Sb)
High-purity antimony source material for compound semiconductor growth.
- Form
- Pieces, shots, ingot
- Purity
- 5N–7N options
AsRepresentative visual
High-Purity Arsenic (As)
High-purity arsenic source material for III–V research.
- Form
- Pieces or lumps
- Purity
- 5N–7N options
GaRepresentative visual
High-Purity Gallium (Ga)
Ultra-high-purity gallium for epitaxy and compound synthesis.
- Form
- Solid / liquid metal
- Purity
- 6N–7N options
InRepresentative visual
High-Purity Indium (In)
High-purity indium pieces, shots and ingots.
- Form
- Shots, pieces, ingot
- Purity
- 5N–7N options
BeRepresentative visual
High-Purity Beryllium (Be)
Specialty high-purity beryllium for controlled research supply.
- Form
- Pieces or custom
- Purity
- High-purity grades
CdRepresentative visual
High-Purity Cadmium (Cd)
High-purity cadmium for II–VI compound research.
- Form
- Shots, pieces, ingot
- Purity
- 5N–7N options
AlRepresentative visual
Aluminum (Al) Sputtering Target
High-purity Aluminum (Al) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiRepresentative visual
Titanium (Ti) Sputtering Target
High-purity Titanium (Ti) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuRepresentative visual
Copper (Cu) Sputtering Target
High-purity Copper (Cu) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CrRepresentative visual
Chromium (Cr) Sputtering Target
High-purity Chromium (Cr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NiRepresentative visual
Nickel (Ni) Sputtering Target
High-purity Nickel (Ni) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoRepresentative visual
Cobalt (Co) Sputtering Target
High-purity Cobalt (Co) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
FeRepresentative visual
Iron (Fe) Sputtering Target
High-purity Iron (Fe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MoRepresentative visual
Molybdenum (Mo) Sputtering Target
High-purity Molybdenum (Mo) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
WRepresentative visual
Tungsten (W) Sputtering Target
High-purity Tungsten (W) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TaRepresentative visual
Tantalum (Ta) Sputtering Target
High-purity Tantalum (Ta) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NbRepresentative visual
Niobium (Nb) Sputtering Target
High-purity Niobium (Nb) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZrRepresentative visual
Zirconium (Zr) Sputtering Target
High-purity Zirconium (Zr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
HfRepresentative visual
Hafnium (Hf) Sputtering Target
High-purity Hafnium (Hf) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SiRepresentative visual
Silicon (Si) Sputtering Target
High-purity Silicon (Si) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
GeRepresentative visual
Germanium (Ge) Sputtering Target
High-purity Germanium (Ge) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZnRepresentative visual
Zinc (Zn) Sputtering Target
High-purity Zinc (Zn) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SnRepresentative visual
Tin (Sn) Sputtering Target
High-purity Tin (Sn) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
InRepresentative visual
Indium (In) Sputtering Target
High-purity Indium (In) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AgRepresentative visual
Silver (Ag) Sputtering Target
High-purity Silver (Ag) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AuRepresentative visual
Gold (Au) Sputtering Target
High-purity Gold (Au) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
PtRepresentative visual
Platinum (Pt) Sputtering Target
High-purity Platinum (Pt) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
PdRepresentative visual
Palladium (Pd) Sputtering Target
High-purity Palladium (Pd) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NiCrRepresentative visual
Nickel Chromium (NiCr) Alloy Target
High-purity Nickel chromium (NiCr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiAlRepresentative visual
Titanium Aluminum (TiAl) Alloy Target
High-purity Titanium aluminum (TiAl) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlCuRepresentative visual
Aluminum Copper (AlCu) Alloy Target
High-purity Aluminum copper (AlCu) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
FeCoRepresentative visual
Iron Cobalt (FeCo) Alloy Target
High-purity Iron cobalt (FeCo) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuGaRepresentative visual
Copper Gallium (CuGa) Alloy Target
High-purity Copper gallium (CuGa) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
InSnRepresentative visual
Indium Tin (InSn) Alloy Target
High-purity Indium tin (InSn) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ITORepresentative visual
ITO Ceramic Sputtering Target
High-purity Indium tin oxide (ITO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AZORepresentative visual
Aluminum-Doped Zinc Oxide (AZO) Target
High-purity Aluminum-doped zinc oxide (AZO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZnORepresentative visual
Zinc Oxide (ZnO) Sputtering Target
High-purity Zinc oxide (ZnO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SiO₂Representative visual
Silicon Dioxide (SiO₂) Sputtering Target
High-purity Silicon dioxide (SiO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Al₂O₃Representative visual
Aluminum Oxide (Al₂O₃) Target
High-purity Aluminum oxide (Al₂O₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiO₂Representative visual
Titanium Dioxide (TiO₂) Target
High-purity Titanium dioxide (TiO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
HfO₂Representative visual
Hafnium Oxide (HfO₂) Target
High-purity Hafnium oxide (HfO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Ta₂O₅Representative visual
Tantalum Oxide (Ta₂O₅) Target
High-purity Tantalum oxide (Ta₂O₅) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Nb₂O₅Representative visual
Niobium Oxide (Nb₂O₅) Target
High-purity Niobium oxide (Nb₂O₅) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Si₃N₄Representative visual
Silicon Nitride (Si₃N₄) Target
High-purity Silicon nitride (Si₃N₄) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlNRepresentative visual
Aluminum Nitride (AlN) Target
High-purity Aluminum nitride (AlN) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiNRepresentative visual
Titanium Nitride (TiN) Target
High-purity Titanium nitride (TiN) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SiCRepresentative visual
Silicon Carbide (SiC) Target
High-purity Silicon carbide (SiC) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
B₄CRepresentative visual
Boron Carbide (B₄C) Target
High-purity Boron carbide (B₄C) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
BRepresentative visual
Boron (B) Sputtering Target
High-purity Boron (B) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
VRepresentative visual
Vanadium (V) Sputtering Target
High-purity Vanadium (V) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MnRepresentative visual
Manganese (Mn) Sputtering Target
High-purity Manganese (Mn) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MgRepresentative visual
Magnesium (Mg) Sputtering Target
High-purity Magnesium (Mg) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
GaRepresentative visual
Gallium (Ga) Sputtering Target
High-purity Gallium (Ga) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SbRepresentative visual
Antimony (Sb) Sputtering Target
High-purity Antimony (Sb) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
BiRepresentative visual
Bismuth (Bi) Sputtering Target
High-purity Bismuth (Bi) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CdRepresentative visual
Cadmium (Cd) Sputtering Target
High-purity Cadmium (Cd) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
YRepresentative visual
Yttrium (Y) Sputtering Target
High-purity Yttrium (Y) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
NiFeRepresentative visual
Nickel Iron (NiFe) Alloy Target
High-purity Nickel iron (NiFe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoCrRepresentative visual
Cobalt Chromium (CoCr) Alloy Target
High-purity Cobalt chromium (CoCr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CoFeBRepresentative visual
Cobalt Iron Boron (CoFeB) Alloy Target
High-purity Cobalt iron boron (CoFeB) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
TiWRepresentative visual
Titanium Tungsten (TiW) Alloy Target
High-purity Titanium tungsten (TiW) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlSiRepresentative visual
Aluminum Silicon (AlSi) Alloy Target
High-purity Aluminum silicon (AlSi) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuInGaRepresentative visual
Copper Indium Gallium (CuInGa) Alloy Target
High-purity Copper indium gallium (CuInGa) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AuGeRepresentative visual
Gold Germanium (AuGe) Alloy Target
High-purity Gold germanium (AuGe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
PtIrRepresentative visual
Platinum Iridium (PtIr) Alloy Target
High-purity Platinum iridium (PtIr) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MgORepresentative visual
Magnesium Oxide (MgO) Sputtering Target
High-purity Magnesium oxide (MgO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
ZrO₂Representative visual
Zirconium Oxide (ZrO₂) Sputtering Target
High-purity Zirconium oxide (ZrO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Y₂O₃Representative visual
Yttrium Oxide (Y₂O₃) Sputtering Target
High-purity Yttrium oxide (Y₂O₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CeO₂Representative visual
Cerium Oxide (CeO₂) Sputtering Target
High-purity Cerium oxide (CeO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
Ga₂O₃Representative visual
Gallium Oxide (Ga₂O₃) Sputtering Target
High-purity Gallium oxide (Ga₂O₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
In₂O₃Representative visual
Indium Oxide (In₂O₃) Sputtering Target
High-purity Indium oxide (In₂O₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
SnO₂Representative visual
Tin Oxide (SnO₂) Sputtering Target
High-purity Tin oxide (SnO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
WO₃Representative visual
Tungsten Oxide (WO₃) Sputtering Target
High-purity Tungsten oxide (WO₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
MoO₃Representative visual
Molybdenum Oxide (MoO₃) Sputtering Target
High-purity Molybdenum oxide (MoO₃) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
VO₂Representative visual
Vanadium Dioxide (VO₂) Sputtering Target
High-purity Vanadium dioxide (VO₂) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CuORepresentative visual
Copper Oxide (CuO) Sputtering Target
High-purity Copper oxide (CuO) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CdSRepresentative visual
Cadmium Sulfide (CdS) Sputtering Target
High-purity Cadmium sulfide (CdS) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
CdTeRepresentative visual
Cadmium Telluride (CdTe) Sputtering Target
High-purity Cadmium telluride (CdTe) sputtering target for PVD and thin-film deposition.
- Diameter
- 2", 3", 4", 6" and custom
- Purity
- 99.9%–99.999% subject to material
AlRepresentative visual
Aluminum (Al) Evaporation Material
High-purity Aluminum (Al) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CrRepresentative visual
Chromium (Cr) Evaporation Material
High-purity Chromium (Cr) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CoRepresentative visual
Cobalt (Co) Evaporation Material
High-purity Cobalt (Co) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CuRepresentative visual
Copper (Cu) Evaporation Material
High-purity Copper (Cu) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
AuRepresentative visual
Gold (Au) Evaporation Material
High-purity Gold (Au) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
HfRepresentative visual
Hafnium (Hf) Evaporation Material
High-purity Hafnium (Hf) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
InRepresentative visual
Indium (In) Evaporation Material
High-purity Indium (In) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
FeRepresentative visual
Iron (Fe) Evaporation Material
High-purity Iron (Fe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
MgRepresentative visual
Magnesium (Mg) Evaporation Material
High-purity Magnesium (Mg) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
MoRepresentative visual
Molybdenum (Mo) Evaporation Material
High-purity Molybdenum (Mo) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
NiRepresentative visual
Nickel (Ni) Evaporation Material
High-purity Nickel (Ni) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
NbRepresentative visual
Niobium (Nb) Evaporation Material
High-purity Niobium (Nb) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
PdRepresentative visual
Palladium (Pd) Evaporation Material
High-purity Palladium (Pd) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
PtRepresentative visual
Platinum (Pt) Evaporation Material
High-purity Platinum (Pt) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Si · EVAPRepresentative visual
Silicon (Si) Evaporation Material
High-purity Silicon (Si) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
AgRepresentative visual
Silver (Ag) Evaporation Material
High-purity Silver (Ag) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
TaRepresentative visual
Tantalum (Ta) Evaporation Material
High-purity Tantalum (Ta) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
TiRepresentative visual
Titanium (Ti) Evaporation Material
High-purity Titanium (Ti) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
WRepresentative visual
Tungsten (W) Evaporation Material
High-purity Tungsten (W) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
ZnRepresentative visual
Zinc (Zn) Evaporation Material
High-purity Zinc (Zn) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
ZrRepresentative visual
Zirconium (Zr) Evaporation Material
High-purity Zirconium (Zr) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
SiO₂Representative visual
Silicon Dioxide (SiO₂) Evaporation Material
High-purity Silicon dioxide (SiO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Al₂O₃Representative visual
Aluminum Oxide (Al₂O₃) Evaporation Material
High-purity Aluminum oxide (Al₂O₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
MgF₂Representative visual
Magnesium Fluoride (MgF₂) Evaporation Material
High-purity Magnesium fluoride (MgF₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
ZnSRepresentative visual
Zinc Sulfide (ZnS) Evaporation Material
High-purity Zinc sulfide (ZnS) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
TiO₂Representative visual
Titanium Dioxide (TiO₂) Evaporation Material
High-purity Titanium dioxide (TiO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
BRepresentative visual
Boron (B) Evaporation Material
High-purity Boron (B) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
BiRepresentative visual
Bismuth (Bi) Evaporation Material
High-purity Bismuth (Bi) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CdRepresentative visual
Cadmium (Cd) Evaporation Material
High-purity Cadmium (Cd) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
GaRepresentative visual
Gallium (Ga) Evaporation Material
High-purity Gallium (Ga) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
GeRepresentative visual
Germanium (Ge) Evaporation Material
High-purity Germanium (Ge) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
MnRepresentative visual
Manganese (Mn) Evaporation Material
High-purity Manganese (Mn) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
SbRepresentative visual
Antimony (Sb) Evaporation Material
High-purity Antimony (Sb) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
SeRepresentative visual
Selenium (Se) Evaporation Material
High-purity Selenium (Se) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
TeRepresentative visual
Tellurium (Te) Evaporation Material
High-purity Tellurium (Te) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
VRepresentative visual
Vanadium (V) Evaporation Material
High-purity Vanadium (V) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
YRepresentative visual
Yttrium (Y) Evaporation Material
High-purity Yttrium (Y) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CaF₂Representative visual
Calcium Fluoride (CaF₂) Evaporation Material
High-purity Calcium fluoride (CaF₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CeF₃Representative visual
Cerium Fluoride (CeF₃) Evaporation Material
High-purity Cerium fluoride (CeF₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
LaF₃Representative visual
Lanthanum Fluoride (LaF₃) Evaporation Material
High-purity Lanthanum fluoride (LaF₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
AlF₃Representative visual
Aluminum Fluoride (AlF₃) Evaporation Material
High-purity Aluminum fluoride (AlF₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Na₃AlF₆Representative visual
Cryolite (Na₃AlF₆) Evaporation Material
High-purity Cryolite (Na₃AlF₆) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
SiORepresentative visual
Silicon Monoxide (SiO) Evaporation Material
High-purity Silicon monoxide (SiO) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Ta₂O₅Representative visual
Tantalum Pentoxide (Ta₂O₅) Evaporation Material
High-purity Tantalum pentoxide (Ta₂O₅) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Nb₂O₅Representative visual
Niobium Pentoxide (Nb₂O₅) Evaporation Material
High-purity Niobium pentoxide (Nb₂O₅) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
HfO₂Representative visual
Hafnium Oxide (HfO₂) Evaporation Material
High-purity Hafnium oxide (HfO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
ZrO₂Representative visual
Zirconium Oxide (ZrO₂) Evaporation Material
High-purity Zirconium oxide (ZrO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Y₂O₃Representative visual
Yttrium Oxide (Y₂O₃) Evaporation Material
High-purity Yttrium oxide (Y₂O₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CeO₂Representative visual
Cerium Oxide (CeO₂) Evaporation Material
High-purity Cerium oxide (CeO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
In₂O₃Representative visual
Indium Oxide (In₂O₃) Evaporation Material
High-purity Indium oxide (In₂O₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
SnO₂Representative visual
Tin Oxide (SnO₂) Evaporation Material
High-purity Tin oxide (SnO₂) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
WO₃Representative visual
Tungsten Oxide (WO₃) Evaporation Material
High-purity Tungsten oxide (WO₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
MoO₃Representative visual
Molybdenum Oxide (MoO₃) Evaporation Material
High-purity Molybdenum oxide (MoO₃) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
ZnSeRepresentative visual
Zinc Selenide (ZnSe) Evaporation Material
High-purity Zinc selenide (ZnSe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CdSRepresentative visual
Cadmium Sulfide (CdS) Evaporation Material
High-purity Cadmium sulfide (CdS) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CdSeRepresentative visual
Cadmium Selenide (CdSe) Evaporation Material
High-purity Cadmium selenide (CdSe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
CdTeRepresentative visual
Cadmium Telluride (CdTe) Evaporation Material
High-purity Cadmium telluride (CdTe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
PbSRepresentative visual
Lead Sulfide (PbS) Evaporation Material
High-purity Lead sulfide (PbS) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
PbSeRepresentative visual
Lead Selenide (PbSe) Evaporation Material
High-purity Lead selenide (PbSe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
PbTeRepresentative visual
Lead Telluride (PbTe) Evaporation Material
High-purity Lead telluride (PbTe) source material for thermal and electron-beam evaporation.
- Form
- Pellets, granules, shots, pieces or custom
- Purity
- 99.9%–99.999% subject to material
Al₂O₃ · CERRepresentative visual
Alumina (Al₂O₃) Technical Ceramic
Alumina (Al₂O₃) supplied in plates, rods, tubes, crucibles and custom parts with application-specific technical review.
- Form
- Plates, rods, tubes, crucibles and custom parts
- Purity
- Application-dependent high-purity grades
ZrO₂Representative visual
Zirconia (ZrO₂) Technical Ceramic
Zirconia (ZrO₂) supplied in plates, rods, tubes and custom parts with application-specific technical review.
- Form
- Plates, rods, tubes and custom parts
- Purity
- Application-dependent high-purity grades
AlNRepresentative visual
Aluminum Nitride (AlN) Ceramic
Aluminum nitride (AlN) supplied in substrates, plates and custom parts with application-specific technical review.
- Form
- Substrates, plates and custom parts
- Purity
- Application-dependent high-purity grades
BNRepresentative visual
Boron Nitride (BN) Ceramic
Boron nitride (BN) supplied in crucibles, plates, rods and custom parts with application-specific technical review.
- Form
- Crucibles, plates, rods and custom parts
- Purity
- Application-dependent high-purity grades
Si₃N₄Representative visual
Silicon Nitride (Si₃N₄) Ceramic
Silicon nitride (Si₃N₄) supplied in plates, rods, tubes and custom parts with application-specific technical review.
- Form
- Plates, rods, tubes and custom parts
- Purity
- Application-dependent high-purity grades
SiCRepresentative visual
Silicon Carbide (SiC) Technical Ceramic
Silicon carbide (SiC) supplied in plates, rings, tubes and custom parts with application-specific technical review.
- Form
- Plates, rings, tubes and custom parts
- Purity
- Application-dependent high-purity grades
LaRepresentative visual
Lanthanum (La) Metal
Lanthanum (La) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
CeRepresentative visual
Cerium (Ce) Metal
Cerium (Ce) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
PrRepresentative visual
Praseodymium (Pr) Metal
Praseodymium (Pr) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
NdRepresentative visual
Neodymium (Nd) Metal
Neodymium (Nd) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
SmRepresentative visual
Samarium (Sm) Metal
Samarium (Sm) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
GdRepresentative visual
Gadolinium (Gd) Metal
Gadolinium (Gd) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
TbRepresentative visual
Terbium (Tb) Metal
Terbium (Tb) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
DyRepresentative visual
Dysprosium (Dy) Metal
Dysprosium (Dy) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
ErRepresentative visual
Erbium (Er) Metal
Erbium (Er) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
YbRepresentative visual
Ytterbium (Yb) Metal
Ytterbium (Yb) supplied in pieces / ingot, powder and custom form with application-specific technical review.
- Form
- Pieces / ingot, powder and custom form
- Purity
- Application-dependent high-purity grades
KF-CLAMPRepresentative visual
KF Vacuum Clamp
Aluminium quick clamp for joining two KF flanges.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- Aluminium / Stainless steel
KF-CENTERING-RING-O-RINGRepresentative visual
KF Centering Ring & O-Ring
Stainless-steel centering ring with vacuum-compatible elastomer seal.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / FKM or NBR
KF-NIPPLERepresentative visual
KF Nipple
Straight stainless-steel tube with KF flanges on both ends.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-ADAPTERRepresentative visual
KF Reducer / Adapter
Reducer and transition fittings between KF nominal sizes.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-CROSSRepresentative visual
KF Cross
Four-port KF cross for gauges, pumping and instrumentation branches.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-TEERepresentative visual
KF Tee
Three-port KF tee for modular vacuum line layouts.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-WELD-STUB-NOZZLERepresentative visual
KF Weld Stub / Nozzle
KF flange with tube stub for welding to chambers and pipelines.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-90-DEGREE-ELBOWRepresentative visual
KF 90° Elbow
Compact right-angle KF fitting for vacuum line routing.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-BLANK-FLANGERepresentative visual
KF Blank Flange
Solid KF blank for safely closing unused vacuum ports.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 / SS316L
KF-FLEXIBLE-HOSERepresentative visual
KF Flexible Hose
Stainless-steel flexible hose for alignment and vibration isolation.
- Available sizes
- KF16, KF25, KF40, KF50
- Material
- SS304 bellows
CF-FIXED-FLANGERepresentative visual
CF Fixed Flange
Fixed-bolt-hole knife-edge flange for bakeable UHV connections.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-ROTATABLE-FLANGERepresentative visual
CF Rotatable Flange
Two-piece rotatable CF flange for bolt-hole alignment.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-COPPER-GASKETRepresentative visual
CF OFHC Copper Gasket
Single-use oxygen-free copper gasket for CF knife-edge seals.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- OFHC copper
CF-BLANK-FLANGERepresentative visual
CF Blank Flange
Solid CF blank for bakeable closure of UHV ports.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-NIPPLERepresentative visual
CF Nipple
Straight UHV tube with CF flanges on both ends.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-90-DEGREE-ELBOWRepresentative visual
CF 90° Elbow
CF elbow for low-outgassing UHV line routing.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-TEERepresentative visual
CF Tee
Three-port CF tee for UHV pumping and instrumentation.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-CROSSRepresentative visual
CF Cross
Four-port CF cross for surface-science and chamber manifolds.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
CF-ADAPTERRepresentative visual
CF Adapter
CF-to-CF reducers and CF-to-KF/ISO transition fittings.
- Available sizes
- CF 1.33", CF 2.75", CF 4.5", CF 6", CF 8"
- Material
- SS304L / SS316L
ISO-CLAW-CLAMPRepresentative visual
ISO-K Claw Clamp
Single and double claw clamps for ISO-K flange assembly.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- Stainless steel / zinc-plated steel
ISO-CENTERING-RING-O-RINGRepresentative visual
ISO Centering Ring & O-Ring
Centering ring assembly for ISO-K and ISO-F vacuum seals.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / FKM or NBR
ISO-BLANK-FLANGERepresentative visual
ISO Blank Flange
ISO-K or ISO-F blank for large vacuum port closure.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L
ISO-NIPPLERepresentative visual
ISO Nipple / Spool
Straight large-bore spool with ISO flanges.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L
ISO-90-DEGREE-ELBOWRepresentative visual
ISO 90° Elbow
Large-bore elbow for high-conductance pumping lines.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L
ISO-TEERepresentative visual
ISO Tee
Three-port ISO fitting for process and pumping manifolds.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L
ISO-CROSSRepresentative visual
ISO Cross
Four-port ISO fitting for large vacuum systems.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L
ISO-REDUCER-ADAPTERRepresentative visual
ISO Reducer / Adapter
ISO size reducers and ISO-to-KF/CF transition pieces.
- Available sizes
- ISO63, ISO80, ISO100, ISO160, ISO200, ISO250
- Material
- SS304 / SS316L