Seramik Oksit Püskürtme Hedefleri
Ceramic Oxide Sputtering Targets, gelişmiş seramik püskürtme hedefleri arasında en yaygın olanıdır. Oksit seramikler, ana bileşenler olarak bir veya daha fazla oksit ve katkı maddesi olarak diğer küçük oksitlerle yüksek sıcaklıklarda sinterlenerek yapılabilir. Bunlar basit oksit seramikler ve karmaşık oksit seramikler olarak ikiye ayrılır.
Dünya çapında yüksek kaliteli Al2O3, SiO2, Nb2Ox, TiOx, ITO, AZO, YSZ, IGZO ve diğer püskürtme hedeflerini sağlıyoruz. Çoğu oksit seramik, yüksek bir erime noktasına, mükemmel yalıtıma, ısı mukavemetine, oksitleyicilere karşı dirence ve korozyona sahiptir. Bu nedenle uzun süre hipertermal ve oksidatif bir ortama maruz kalabilirler ve birçok mühendislik uygulamasına sahip olabilirler.
Kusurlardan biri, yüksek sıcaklıklarda plastik deformasyona karşı savunmasızlıktır, bu da onları yüksek sıcaklıkta yapısal malzemeler olarak kullanılmaya uygun hale getirmez. Püskürtme hedeflerimizin şu avantajları vardır: tek tip renk, pürüzsüz yüzey, çatlak yok, ufalanma yok, harici kalıntı yok ve kirletici madde yok.
Ceramic Oxide Sputtering Target List
| Aluminum Oxide Sputtering Targets | Al2O3 | 99.99% |
| Antimony Oxide Sputtering Targets | Sb2O3 | 99.99% |
| AZO Sputtering Targets | Al2O3/ZnO 2/98 wt% | 99.99% |
| Barium Carbonate Sputtering Targets | BaCO3 | 99.90% |
| Barium Cerium Yttrium Zirconate Sputtering Targets | BaCe(1-x-y)Y(x)Zr(y)O3 | 99.90% |
| Barium Ferrite Sputtering Targets | BaFe12O19 | 99.90% |
| Barium Oxide Sputtering Targets | BaO | 99.90% |
| Barium Strontium Titanate Sputtering Targets | Ba(1-x)Sr(x)TiO3 | 99.90% |
| Barium Strontium Titanate Sputtering Targets | Ba0.5Sr0.5TiO3 | 99.90% |
| Barium Titanate Sputtering Targets | BaTiO3 | 99.90% |
| Barium Zirconate Sputtering Targets | BaZrO3 | 99.90% |
| Bismuth Calcium Ferrite Sputtering Targets | Bi0.9Ca0.1FeO3 | 99.90% |
| Bismuth Dysprosium Iron Gallate Sputtering Targets | Bi2DyFe4GaO12 | 99.90% |
| Bismuth Ferrite (Garnet) Sputtering Targets | Bi3Fe5O12 | 99.90% |
| Bismuth Ferrite Sputtering Targets | BiFeO3 | 99.90% |
| Bismuth Lanthanum Ferrite Sputtering Targets | Bi(1-x) LaxFeO3 | 99.90% |
| Bismuth Lutetium Iron Gallate Sputtering Targets | Bi1.5Lu1.5Fe4GaO12 | 99.90% |
| Bismuth Manganate Sputtering Targets | Bi2.4MnO3 | 99.90% |
| Bismuth Oxide Sputtering Targets | Bi2O3 | 99.99% |
| Bismuth Titanate Sputtering Targets | Bi4Ti3O3 | 99.99% |
| Boron Oxide Sputtering Targets | B2O3 | 99.90% |
| Cadmium Oxide Sputtering Targets | CdO | 99.9 – 99.99% |
| Cadmium Stannate Sputtering Targets | Cd2SnO4 | 99.9 – 99.99% |
| Calcium Oxide Sputtering Targets | CaO | 99.95% |
| Calcium Phosphate Sputtering Targets | Ca3(PO4)2 | 99.90% |
| Calcium Phosphate Tribasic Sputtering Targets | Ca10 (OH)2 (PO4)6 | 99.90% |
| Calcium Titanate Sputtering Targets | CaTiO3 | 99.99% |
| Cerium Bismuth Ferrite Sputtering Targets | Ce2.2Bi0.8Fe5O12 | 99.99% |
| Cerium Oxide Sputtering Targets | CeO2 | 99.90% |
| Cerium Yttrium Ferrite Sputtering Targets | Ce2.5Y0.5Fe5O12 | 99.90% |
| Chromium Oxide Sputtering Targets | Cr2O3 | 99.90% |
| Chromium Oxide Sputtering Targets | CrO3 | 99.90% |
| Chromium Silicate Sputtering Targets | CrSiO2 | 99.90% |
| Cobalt Ferrite Sputtering Targets | CoFe2O4 | 99.90% |
| Cobalt Oxide Sputtering Targets | Co3O4 | 99.90% |
| Cobalt Oxide Sputtering Targets | CoO | 99.90% |
| Copper Aluminum Oxide Sputtering Targets | CuAlO2 | 99.90% |
| Copper Oxide Sputtering Targets | Cu2O | 99.90% |
| Copper Oxide Sputtering Targets | CuO | 99.90% |
| Dysprosium Oxide Sputtering Targets | Dy2O3 | 99.90% |
| Erbium Oxide Sputtering Targets | Er2O3 | 99.90% |
| Europium Nickel Oxide Sputtering Targets | EuNiO3 | 99.90% |
| Europium Oxide Sputtering Targets | Eu2O3 | 99.50% |
| Europium Titanate Sputtering Targets | EuTiO3 | 99.90% |
| Gadolinium Cerium Oxide Sputtering Targets | Gd0.2Ce0.8O2 | 99.90% |
| Gadolinium Oxide Sputtering Targets | Gd2O3 | 99.90% |
| Gallium Oxide Sputtering Targets | Ga2O3 | 99.9 – 99.99% |
| Germanium Oxide Sputtering Targets | GeO2 | 99.9 – 99.99% |
| Hafnium Oxide Sputtering Targets | HfO2 | 99.99% |
| Holmium Oxide Sputtering Targets | Ho2O3 | 99.9 – 99.95% |
| Indium Aluminum Zinc Oxide Sputtering Targets | In2O3/Al2O3/ZnO 65/16/19 wt% | 99.99% |
| Indium Gallium Zinc Oxide (IGZO) Sputtering Targets | InGaZnO4 | 99.99% |
| Indium Iron Oxide Sputtering Targets | InFe2O4 | 99.90% |
| Indium Molybdenum Oxide Sputtering Targets | In2O3/Mo 98/2 wt% | 99.99% |
| Indium Oxide Sputtering Targets | In2O3 | 99.99% |
| Indium Tin Oxide (ITO) Sputtering Targets | ITO, In2O3/SnO2, 90/10 wt% | 99.99% |
| Indium Zinc Oxide (IZO) Sputtering Targets | IZO, In2O3/ZnO, 90/10 wt% | 99.99% |
| Iridium Oxide Sputtering Targets | IrO2 | 99.90% |
| Iron Oxide Sputtering Targets | Fe2O3 | 99.5- 99.9% |
| Iron Oxide Sputtering Targets | Fe3O4 | 99.9 – 99.99% |
| Lanthanum Aluminate Sputtering Targets | LaAlO3 | 99.90% |
| Lanthanum Calcium Manganate Sputtering Targets | La0.5Ca0.5MnO3 | 99.90% |
| Lanthanum Calcium Manganate Sputtering Targets | La0.7Ca0.3MnO3 | 99.90% |
| Lanthanum Calcium Manganate Sputtering Targets | La1-xCaxMnO3 | 99.90% |
| Lanthanum Copper Manganate Sputtering Targets | La2CuMnO6 | 99.90% |
| Lanthanum Copper Oxide Sputtering Targets | La2CuO4 | 99.90% |
| Lanthanum Ferrite Sputtering Targets | LaFeO3 | 99.90% |
| Lanthanum Gallate Sputtering Targets | LaGaO3 | 99.90% |
| Lanthanum Lithium Titanate Sputtering Targets | La(1-x) LixTiO3 | 99.90% |
| Lanthanum Manganate Sputtering Targets | LaMnO3 | 99.90% |
| Lanthanum Nickel Oxide Sputtering Targets | LaNiO3 | 99.90% |
| Lanthanum Oxide Sputtering Targets | La2O3 | 99.99% |
| Lanthanum Praseodymium Calcium Manganate Sputtering Targets | La(1-x-y)PrxCayMnO3 | 99.90% |
| Lanthanum Scandium Oxide Sputtering Targets | LaScO3 | 99.90% |
| Lanthanum Strontium Chromate Sputtering Targets | La(1-x)SrxCrO3 | 99.90% |
| Lanthanum Strontium Cobalt Oxide Sputtering Targets | La0.5Sr0.5CoO3 | 99.90% |
| Lanthanum Strontium Cobalt Iron Oxide Sputtering Targets (LSCF) | LaxSr1-xCoyFe1-yO3 | 99.90% |
| Lanthanum Strontium Copper Oxide Sputtering Targets | La(1-x)SrxCuO4 | 99.90% |
| Lanthanum Strontium Manganate Sputtering Targets | La0.67Sr0.33MnO3 | 99.90% |
| Lanthanum Strontium Manganate Sputtering Targets | La0.7Sr0.3MnO3 | 99.90% |
| Lanthanum Strontium Manganate Sputtering Targets | La0.9Sr0.1MnO3 | 99.90% |
| Lanthanum Strontium Manganate Sputtering Targets | La1-xSrxMnO3 | 99.90% |
| Lanthanum Titanate Sputtering Targets | LaTiO3 | 99.90% |
| Lanthanum Vanadium Oxide Sputtering Targets | LaVO3 | 99.90% |
| Lead Calcium Titanate Sputtering Targets | Pb0.7Ca0.3TiO3 | 99.90% |
| Lead Lanthanum Zirconium Titanate Sputtering Targets (PLZT) | Pb1-xLax(ZryTi1-y)1-0.25xO3 | 99.90% |
| Lead Oxide Sputtering Targets | PbO | 99.90% |
| Lead Titanate Sputtering Targets | PbTiO3 | 99.90% |
| Lead Zirconate Titanate with Niobium Sputtering Targets | PbZr0.52Ti0.48O3 with 1 at% Nb | 99.90% |
| Lead Zirconate Sputtering Targets | PbZrO3 | 99.90% |
| Lead Zirconium Titanate Sputtering Targets | PZT, PbZr0.52Ti0.48O3 | 99.90% |
| Lithium Cobalt Oxide Sputtering Targets | LiCoO2 | 99.99% |
| Lithium Nickel Vanadium Oxide Sputtering Targets | LiNiVO4 | 99.90% |
| Lithium Iron PhosphateSputtering Targets | LiFePO4 | 99.90% |
| Lithium Manganate Sputtering Targets | LiMn2O4 | 99.90% |
| Lithium Nickel Cobalt Oxide Sputtering Targets | LiNi(1-x)CoxO2 | 99.90% |
| Lithium Nickel Manganese Cobalt Oxide Sputtering Targets | LiNi0.33Mn0.33Co0.33O2 | 99.9% |
| Lithium Nickel Phosphate Sputtering Targets | LiNiPO4 | 99.99% |
| Lithium Niobate Sputtering Targets | LiNbO3 | 99.99% |
| Lithium Phosphate Sputtering Targets | Li3PO4 | 99.99% |
| Lithium Silicate Sputtering Targets | Li4SiO4 | 99.99% |
| Lithium Tantalate Sputtering Targets | LiTaO3 | 99.90% |
| Lithium Titanate Sputtering Targets | Li4Ti5O12 | 99.90% |
| Lithium Zirconate Sputtering Targets | Li6Zr2O7 | 99.90% |
| Lutetium Oxide Sputtering Targets | Lu2O3 | 99.9-99.99% |
| Magnesium aluminate Sputtering Targets | MgAl2O4 | 99.90% |
| Magnesium Oxide Sputtering Targets | MgO | 99.95% |
| Magnesium Zinc Oxide Sputtering Targets | Mg(1-x) ZnxO | 99.95% |
| Manganese Cobalt Oxide Sputtering Targets | MnCo2O4 | 99.90% |
| Manganese Oxide Sputtering Targets | MnO | 99.90% |
| Molybdenum Oxide Sputtering Targets | MoO3 | 99.90% |
| Neodymium Aluminate Sputtering Targets | NdAlO3 | 99.90% |
| Neodymium Copper Oxide Sputtering Targets | Nd2CuO4 | 99.90% |
| Neodymium Gadolinium Oxide Sputtering Targets | NdGdO3 | 99.90% |
| Neodymium Nickel Oxide Sputtering Targets | NdNiO3 | 99.90% |
| Neodymium Oxide Sputtering Targets | Nd2O3 | 99.90% |
| Neodymium Strontium Manganate Sputtering Targets | Nd(1-x)SrxMnO3 | 99.90% |
| Nickel Ferrite Sputtering Targets | NiFe2O4 | 99.90% |
| Nickel Oxide Sputtering Targets | NiO | 99.90% |
| Niobium Oxide Sputtering Targets | Nb2O5 | 99.95% |
| Niobium Oxide Sputtering Targets | Nb2Ox | 99.95% |
| Potassium Niobate Sputtering Targets | KNbO3 | 99.95% |
| Praseodymium Calcium Manganate Sputtering Targets | Pr0.7Ca0.3MnO3 | 99.90% |
| Praseodymium Cerium Manganate Sputtering Targets | Pr(1-x)CexMnO3 | 99.90% |
| Praseodymium Nickel Oxide Sputtering Targets | PrNiO | 99.90% |
| Praseodymium Oxide Sputtering Targets | Pr2O3 | 99.90% |
| Ruthenium Oxide Sputtering Targets | RuO2 | 99.90% |
| Samarium Cerium Copper Oxide Sputtering Targets | Sm(1-x)CexCuO4 | 99.90% |
| Samarium Copper Oxide Sputtering Targets | SmCuO4 and Sm2CuOx | 99.90% |
| Samarium Oxide Sputtering Targets | Sm2O3 | 99.9 – 99.99% |
| Scandium Oxide Sputtering Targets | Sc2O3 | 99.9 99.99% |
| Selenium Oxide Sputtering Targets | SeO2 | 99.90% |
| Silicon Dioxide Sputtering Targets | SiO2 | 100.00% |
| Silicon Monoxide Sputtering Targets | SiO | 99.90% |
| Sodium Niobate Sputtering Targets | NaNbO3 | 99.99% |
| Strontium Aluminate doped with Europium Sputtering Targets | SrAl2O4 with 3 wt% Eu | 99.90% |
| Strontium Bismuth Niobate Sputtering Targets | SBN (SrBi2Nb2O9) | 99.90% |
| Strontium Bismuth Tantalate Sputtering Targets | SBT (Sr0.8Bi2.2Ta2O9) | 99.90% |
| Strontium Copper Oxide Sputtering Targets | SrCuO2 | 99.90% |
| Strontium Lead Oxide Sputtering Targets | Sr3PbO | 99.90% |
| Strontium Manganate Sputtering Targets | SrMnO3 | 99.90% |
| Strontium Niobium Titanate Sputtering Targets | SrNb(1-x)TixO3 | 99.90% |
| Strontium Oxide Sputtering Targets | SrO | 99.50% |
| Strontium Ruthanate Sputtering Targets | SrRuO3 | 99.90% |
| Strontium Titanate Sputtering Targets | SrTiO3 | 99.90% |
| Strontium Zirconate Sputtering Targets | SrZrO3 | 99.90% |
| Tantalum Oxide Sputtering Targets | Ta2O5 | 99.95% |
| Tantalum Oxide Sputtering Targets | Ta2Ox | 99.95% |
| Tellurium Oxide Sputtering Targets | TeO2 | 99.9 – 99.99% |
| Terbium Ferrite Sputtering Targets | Tb3Fe5O12) | 99.90% |
| Terbium Manganate Sputtering Targets | TbMnO3 | 99.90% |
| Terbium Oxide Sputtering Targets | Tb4O7 | 99.9 – 99.95% |
| Tin Oxide Sputtering Targets | SnO2 | 99.99% |
| Titanium Dioxide Sputtering Targets | TiO2 | 99.99% |
| Titanium Ferrite Sputtering Targets | TiFe2O4 | 99.90% |
| Titanium Monoxide Sputtering Targets | TiO | 99.90% |
| Tungsten Oxide Sputtering Targets | WO3 | 99.90% |
| Vanadium Dioxide Sputtering Targets | VO2 | 99.90% |
| Vanadium Oxide Sputtering Targets | V2O5 | 99.90% |
| Ytterbium Oxide Sputtering Targets | Yb2O3 | 99.90% |
| Yttrium Aluminum Oxide Sputtering Targets | Y3Al5O12 | 99.90% |
| Yttrium Ferrite Sputtering Targets | Y3Fe5O12 | 99.90% |
| Yttrium Manganate Sputtering Targets | YMnO3 | 99.90% |
| Yttrium Oxide Sputtering Targets | Y2O3 | 99.90% |
| Zinc Oxide Alumina (AZO) Sputtering Targets | ZnO/Al2O3 (2% Standard Doping) | 99.99% |
| Zinc Oxide doped with Gallium Oxide (GZO) Sputtering Targets | GZO, ZnO/Ga2O3 95/05 wt% | 99.99% |
| Zinc Oxide doped with Magnesium Sputtering Targets | Zn0.9Mg0.1O | 99.90% |
| Zinc Oxide doped with Manganese Sputtering Targets | ZnO with 0.3 wt% Mn | 99.90% |
| Zinc Oxide doped with Manganese Sputtering Targets | ZnO with 4 wt% Mn | 99.90% |
| Zinc Oxide doped with Scandia Sputtering Targets | ZnO/Sc2O3 98/02 wt% | 99.90% |
| Zinc Oxide doped with Sodium Sputtering Targets | Zn0.99Na0.01O | 99.90% |
| Zinc Oxide Sputtering Targets | ZnO | 99.9, 99.99% |
| Zirconia stabilized with Yttria Sputtering Targets | Zr(1-x)YxO2 | 99.90% |
| Zirconium Oxide Sputtering Targets | ZrO2 | 99.90% |
| Zirconia Fully Stabilized with Yttria Sputtering Targets (YSZ) | ZrO2 (fully stabilized – Y2O3) | 99.90% |
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